System and Method for Providing Modified Illumination Intensity

ABSTRACT

A lithography system including a polarized illumination source, a birefringence-controllable optical element, a birefringence inducer, a pattern generator, a linear polarizer, and a projection system. The polarized illumination source is configured to provide polarized light. The birefringence-controllable optical element is optically coupled to the polarized illumination source. The birefringence inducer is coupled to the birefringence-controllable optical element and configured to induce birefringence on the birefringence-controllable optical element to provide polarization-retarded polarized light. The pattern generator is optically coupled to the birefringence-controllable optical element. The linear polarizer is optically coupled to the pattern generator and configured (i) to receive the polarization-retarded polarized light and (ii) modify intensity distribution of the polarization-retarded polarized light to provide modified polarization-retarded polarized light. The projection system is configured to project the modified polarization-retarded polarized light.

CROSS REFERENCE TO RELATED APPLICATIONS

This application is a divisional of U.S. patent application Ser. No.11/094,313 to Roel De Jonge, entitled “System and Method for ProvidingModified Illumination Intensity” and filed Mar. 31, 2005, now allowed,the entirety of which is incorporated by reference herein.

BACKGROUND

1. Field

The present invention is related to illumination intensity uniformitycompensators.

2. Related Art

Uniformity compensators (also known as UniComs, by those skilled in therelevant art) are used in many systems, including lithography systems,for example, to provide an illumination intensity distribution that isas close as possible to a desired illumination intensity distribution.In lithography, for example, a uniform illumination intensity is desiredat the substrate level. A uniformity compensator can be located in alithography system (at an illuminator or slit, for example) tocompensate for effects introduced by the projection optics. In oneexample, an optimal uniformity distribution provided by a uniformitycompensator can be a certain non-uniform distribution.

Some previous uniformity compensators used in lithography systemscompensate via gray filters, for example, for low frequency uniformityvariations over the slit. This can result in non-uniformity with anundesirable high frequency variation component. In addition, somecurrently known uniformity compensators and compensation methods have anegative impact on dose quantization due to changing of the effectiveslit width and/or the number of pulses in the slit. For example, somelithography systems can compensate for higher frequencies using a fingerarray moving from the side into the slit. However, these systems alterthe slit width and number of laser pulses in the slit locally, dependingon the position of each finger. Furthermore, the illumination intensitydistribution requirement for modern lithography systems is tightening.Modern lithography systems currently require illumination intensitydistribution variation of less than about 0.1%.

Therefore, what is needed is an illumination intensity uniformitycompensator that can compensate for high frequencies and does notsubstantially affect the dose quantization. What is also needed is anillumination intensity uniformity compensator that does not affect theeffective slit width and allows the number of pulses in the slit toremain unchanged.

SUMMARY

An embodiment of the present invention provides a system for providing amodified illumination intensity distribution of polarized light thatincludes a birefringence-controllable optical element. The system alsoincludes a birefringence inducer and a linear polarizer, both coupled tothe birefringence-controllable optical element. The birefringenceinducer induces or changes birefringence in thebirefringence-controllable optical element in order to providepolarization retardation in a light beam passing through thebirefringence-controllable optical element. The linear polarizer filtersthe polarization of the light beam to produce a linear polarizedmodified intensity light beam.

In some embodiments, the optical element can include abirefringence-controllable optical plate or an array ofbirefringence-controllable optical plates. In embodiments using one ormore optical plates, the birefringence inducer can include an externalforce generator. The external force generator can include a mechanicalforce generator, an electrical field generator, a magnetic fieldgenerator, or an acoustic wave generator, for example. In alternativeembodiments, the optical element can be a birefringence-controllableadjustable optical compensator, such as a commercially availableSoleil-Babinet Compensator (SBC).

Some embodiments include a control system that controls the inducementof birefringence by the birefringence inducer, thereby controlling theillumination intensity of the output of the linear polarizer. Thecontrol system can include an intensity detector and controller, and canprovide a control signal to the birefringence inducer.

An embodiment of the present invention provides a method of providing amodified illumination intensity distribution of polarized light,including the steps of transmitting a polarized light beam to abirefringence-controllable optical element, adjusting birefringence ofthe birefringence-controllable optical element to produce apolarization-retarded light beam, and linearly polarizing thepolarization-retarded light beam to produce a linear polarized modifiedintensity light beam. In one embodiment, the adjusting step includesapplying an external force on the birefringence-controllable opticalelement, such as a mechanical, electrical, magnetic, or acousticalforce. In some embodiments, the method further includes controlling thelinear polarized modified intensity light beam. In an embodiment, themethod can include detecting illumination intensities of the linearpolarized modified intensity light beam, generating a control signalbased on the detected illumination intensities, and performing theadjusting step based on the control signal.

A further embodiment of the present invention includes a lithographysystem that includes a polarized illumination source, abirefringence-controllable optical element optically coupled to thepolarized illumination source, and a birefringence inducer coupled tothe birefringence-controllable optical element. The system also includesa pattern generator optically coupled to the birefringence-controllableoptical element, a linear polarizer optically coupled to the patterngenerator, and a projection system optically coupled to the linearpolarizer that can project a light beam onto an object, such as a workpiece. In an embodiment, the lithography system further includes acontrol system.

Further embodiments, features, and advantages of the present invention,as well as the structure and operation of the various embodiments of thepresent invention, are described in detail below with reference to theaccompanying drawings.

BRIEF DESCRIPTION OF THE DRAWINGS/FIGURES

The accompanying drawings, which are incorporated herein and form a partof the specification, illustrate one or more embodiments of the presentinvention and, together with the description, further serve to explainthe principles of the invention and to enable a person skilled in thepertinent art to make and use the invention.

FIG. 1 depicts an illumination intensity uniformity compensator,according to embodiments of the present invention.

FIG. 2 depicts an illumination intensity uniformity compensator with acontrol system, according to an embodiment of the present invention.

FIGS. 3 and 4 depict different states of an adjustable opticalcompensator, such as a Soleil-Babinet Compensator (SBC).

FIG. 5 is a flowchart depicting a method of providing a modifiedillumination intensity distribution of polarized light, according toembodiments of the present invention.

FIG. 6 is a flowchart depicting step 508 of the method depicted in FIG.5, according to an embodiment of the present invention.

FIG. 7 depicts a lithography system that includes an illuminationintensity uniformity compensator, according to embodiments of thepresent invention.

The present invention will now be described with reference to theaccompanying drawings. In the drawings, like reference numbers mayindicate identical or functionally similar elements. Additionally, theleft-most digit(s) of a reference number may identify the drawing inwhich the reference number first appears.

DETAILED DESCRIPTION OF THE INVENTION Overview

While specific configurations and arrangements are discussed, it shouldbe understood that this is done for illustrative purposes only. A personskilled in the pertinent art will recognize that other configurationsand arrangements can be used without departing from the spirit and scopeof the present invention. It will be apparent to a person skilled in thepertinent art that this invention can also be employed in a variety ofother applications.

Embodiments of the present invention provide a system and method forproviding a modified illumination intensity distribution in a polarizedlight beam utilizing a birefringence-controllable optical element uponwhich birefringence is induced to change an index of refraction withinthe optical element. The optical element can be made from an opticallyanisotropic material, which is a material that exhibits opticalproperties with different values when measured in different directions.Many crystalline substances, for example, are optically anisotropic.Other materials are not optically anisotropic in their normal state, butcan have optically anisotropic properties induced in them. Birefringenceis one such optically anisotropic property. The optical element canalternatively be made from such a non-optically-anisotropic material.

Birefringence is the refraction of light in two slightly differentdirections to form two rays. In other words, a birefringent material isone that displays at least two different indices of refraction.Inducing, or changing, the birefringence of an optical element made froma birefringent material changes the indices of refraction in the opticalelement. A change in an index of refraction imparts a change to theoptical performance of the optical element, such that the illuminationintensity of a beam of polarized radiation can change as it passesthrough the optical element and a subsequently placed polarizer.Individually adjusting variable illumination intensities within a lightbeam in this manner can result in a light beam of more uniformillumination intensity. In a lithography system, for example, thistechnique can be used to compensate for effects on illuminationintensity introduced by projection optics, which provides a light beamof more uniform illumination intensity to a workpiece.

The Physics Behind Birefringence

An understanding of the physics behind birefringence may be helpful inreading the following invention description. The information found inthe following paragraphs was taken from Hecht, Eugene, Optics,Addison-Wesley, Reading, Mass., Third Edition, Chapter 8, pages 319-376,Copyright 1998 by Addison Wesley Longman, Inc, which is incorporatedherein by reference in its entirety.

Some materials, such as cubic crystals, are optically isotropic. Thesematerials have a single index of refraction and are not birefringent intheir normal state. Other materials, such as hexagonal, tetragonal, andtrigonal crystals are anisotropic and birefringent because their atomsare arranged such that light is incident upon an asymmetric structure.Crystals in which there is only one optic axis (i.e., only one directionin which atoms are symmetrically arranged) are uniaxial crystals.Uniaxial substances have two principle indices of refraction. Onerefractive index, n₀, corresponds to the natural spherical o-waveletsradiated from the material, and is represented by the equation n₀≡c/ν⊥,where c is the speed of light and ν⊥ is the speed with which thespherical o-wavelets expand. The other refractive index, n_(e),corresponds to the natural ellipsoidal e-wavelets radiated from thematerial, and is represented by the equation n_(e)≡c/ν∥, where ν∥ is thespeed with which the e-wavelets expand normal to the optic axis.Birefringence is equal to the difference Δn=n_(e)−n₀. With two indicesof refraction, a light beam through the crystal will become twoorthogonal beams. (See Hecht, sections 8.4, 8.4.1, and 8.4.2, on pages330-338.) (There are other crystals, such as orthorhombic, monoclinic,and triclinic crystals, that are biaxial (i.e., have two optic axes) andhave three different indices of refraction. (See Hecht, section 8.4.2,page 338.) However, the properties of these biaxial crystals will not bediscussed here.)

As described later in this document, optical effects, such asbirefringence, can be induced in an optical element even if the opticalelement is made from a material that is not optically anisotropic in itsnormal state. In materials that are optically anisotropic, thebirefringence can be changed by this inducement. The means used toinduce birefringence can be, for example, mechanical, acoustical,electrical, or magnetic means. The physics behind some of these meanswill now be briefly described.

The application of mechanical stress on a substance can induce, orchange, birefringence in that substance. This mechanical birefringenceis also known as stress birefringence or photoelasticity. Mechanicalbirefringence can be obtained through, for example, applying compressionor tension on the substance. The application of mechanical stresscreates an effective optic axis in the direction of the stress. Theinduced birefringence is proportional to the stress. The resultingbirefringence is not uniform if the applied stress is not uniform. Withsuch non-uniformity, the retardance of a transmitted wave is also notuniform. The retardance at any location in the substance is proportionalto the principal stress difference (σ₁−σ₂), where σ₁ and σ₂ areorthogonal principal stresses (e.g., vertical and horizontal stresses).The principal stresses (and their differences) can vary at differentareas of a substance. (See Hecht, section 8.11.1, on pages 360-362.)

The application of a magnetic field can also induce, or change,birefringence in a substance. When a strong magnetic field is applied inthe propagation direction of linear light incident on a material, theplane of vibration of the light will rotate. This is called the FaradayEffect. The angle (in minutes of arc) through which the plane ofvibration rotates is β=

Bd, where B is the static magnetic flux density, d is the length of themedium traversed, and

is the Verdet constant of the material. Because of this effect, magneticfields have been used in the making of optical modulators. (See Hecht,section 8.11.2, on pages 362-363.)

The application of an electric field can also induce, or change,birefringence in a substance. When an electric field is applied, twoindices of refraction can result. One index of refraction, n∥,corresponds to the orientation of the plane-of-vibration of the wavethat is parallel to the applied electric field. The other index ofrefraction, n⊥, corresponds to the orientation of the plane-of-vibrationof the wave that is perpendicular to the applied electric field.Birefringence is equal to the difference between n∥ and n⊥. Δn=λ₀KE²,where λ₀ is the wavelength, E is the electric field, and K is the Kerrconstant of the substance. This phenomenon is known as the Kerr Effect.The Kerr Effect is proportional to the square of the electric field andis sometimes called the quadratic electro-optical effect. (See Hecht,section 8.11.3, on pages 363-364.)

Another electro-optical effect is the Pockels Effect. As opposed to thequadratic electro-optical Kerr Effect, the Pockels Effect is a linearelectro-optical effect. With the Pockels Effect, the inducedbirefringence is proportional to the first power of the appliedelectrical field, and therefore is proportional to the applied voltage.This effect only occurs in materials that do not have a center ofsymmetry. (See Hecht, section 8.11.3, on pages 364-366.)

For more information on birefringence generally and/or ways to induceoptical effects, see Hecht, Eugene, Optics, Addison-Wesley, Reading,Mass., Third Edition, Chapter 8, pages 319-376, Copyright 1998 byAddison Wesley Longman, Inc, which, as stated earlier, is incorporatedherein by reference in its entirety.

Exemplary Uniformity Compensators

FIGS. 1 and 2 depict an example uniformity compensator system, accordingto various embodiments of the present invention. The uniformitycompensator system of FIG. 2 is similar to that of FIG. 1, but furtherincludes a control system, as will be later discussed.

FIG. 1 shows system 100 that includes an optical element 110, abirefringence inducer 108, and a polarizer 120. Optical element 110 cancomprise one or more birefringence-controllable optical sub-elements111, such as birefringence-controllable optical plates or adjustableoptical compensators. For example, optical element 110 can comprise anarray of optical plates or an array of adjustable optical compensators.In FIG. 1, an array of five optical sub-elements 111 is illustrated forsimplicity. However, an array of any size can be used, such as array114, shown as a top view, which comprises a two-by-twenty-four (2×24)array of optical sub-elements. An array can be a finger-type array, aswould be known by those skilled in the relevant art.

The birefringence-controllable material used to form optical element 110should be a material that is optically active under physical stress orunder electric or magnetic fields, for example. In one example, opticalelement 110 is made from Calcium Fluoride (CaF₂). Calcium Fluoride(CaF₂) is a birefringent material in its normal state, in which casebirefringence can be induced upon it to correct or change the propertiesof light passing through it. In another example, optical element 110 ismade from Silicon Dioxide (SiO₂). Silicon Dioxide (SiO₂) is notbirefringent in its normal state, but birefringence can be induced.Other optically active materials can also be used, as discussed below,and as would be recognized by those of skill in the relevant art.

In embodiments in which optical element 110 is an array of opticalplates, the plates should be placed as close together as possible, andcan even be placed as to slightly overlap. The size of the opticalplates can be on the order of millimeters. In an exampletwo-by-twenty-four (2×24) array, such as array 114, optical plates ofabout 3 mm to about 5 mm can be used. The more plates used, and thesmaller the plates, the more uniform the resulting illuminationintensity profile. As stated earlier, the array of optical plates can beof any size.

The birefringence inducer 108 optionally forms part of the opticalsub-elements 111, as when using adjustable optical compensators such asSoleil-Babinet Compensators described below, for example. In thealternative, the birefringence inducer 108 is external to the opticalsub-elements 111.

Optical element 110 receives a polarized illumination beam 102 withpolarization 104 and illumination intensity profile 106, for example. Inan embodiment, polarized illumination beam 102 is linearly polarized. Inother embodiments, polarized illumination beam 102 is partly polarized(e.g., elliptically polarized). As shown in FIG. 1, illuminationintensity profile 106 shows variability of illumination intensity inillumination beam 102. In order to obtain a desired illuminationintensity profile, birefringence can be induced on the one or moreoptical sub-elements 111 using the birefringence inducer 108. Thisintroduces locally varying retardation of the light beam polarization asa function of the locally induced birefringence. A subsequently placedpolarizer 120 can remove light intensity, also as a function of thelocally induced birefringence.

In an embodiment, birefringence is induced by applying external forceson each of the optical sub-elements 111 individually. Thus, the singularterm “birefringence inducer 108” as used herein also encompasses pluralbirefringence inducers as there can be a birefringence inducer 108 foreach optical sub-element 111. The more stress applied to an opticalsub-element 111, the more birefringence, and the more retardation inpolarization. Therefore, in this example, the most stress should beapplied to the optical sub-element 111 associated with the highestillumination intensity in order to create more polarization-retardation.In this manner, the polarization-retardation of the portion of theillumination beam passing through each optical sub-element 111 isindividually adjusted.

As a result of the stress-induced birefringence on optical element 110,the output beam 116 as output from optical element 110 has retardedpolarizations 118 that are rotated from the polarization 104 of theoriginal illumination beam 102. Output beam 116 is then passed through apolarizer 120 with polarization 122, in order to filter out any unwantedpolarization and intensity. The resulting beam 124 is then ofpolarization 126 (the polarization 122 of polarizer 120). If polarizedillumination beam 102 is a linear polarized illumination beam, a mostuniform (equally distributed) intensity distribution can be obtained byapplying a retardation angle of a polarization vector equal toα=arcsin(I_(o)/I_(i)), where I_(i) is the starting local intensity on aportion of output beam 116, and I_(o) is the desired local intensity. Inthis case, resulting beam 124 has uniform illumination intensity profile128.

According to embodiments in which optical element 110 is an array ofoptical plates, birefringence inducer 108 includes mechanical means,such as, for example, means for bending, compressing, applying tensionto, or pushing on the optical plates. In alternative embodiments usingan array of optical plates, birefringence inducer 108 includeselectrical means, such as, for example, means for applying an electricfield. In further embodiments, birefringence inducer 108 includesmagnetic means (e.g., means for applying a magnetic field) or acousticalmeans (e.g., means for applying an acoustic wave). The exampleembodiments of birefringence inducer 108 presented here are by way ofexample only, and not limitation. Other birefringence inducers 108 willbe apparent to persons skilled in the relevant art without departingfrom the spirit and scope of the invention.

In embodiments that induce birefringence mechanically on optical plates,each optical plate can be held within the system, for example, by beingmounted on two sides (e.g., clamping the top and bottom), such that theoptical path is not blocked. Mechanical stress can be uniformly placed,for example, on one side or on opposing sides, depending on themechanical means used. In other embodiments, the optical plates can bemounted in other ways. For example, in embodiments that inducebirefringence electrically or magnetically, an electric or magneticfield can be applied on the optical plates from a device mountedelsewhere such that the manner of mounting the optical plates can beaccomplished in many acceptable ways, keeping the optical path free, aswould be recognized by those skilled in the relevant art.

As stated earlier, an embodiment includes a control system to detect theillumination intensities of polarizer output beam 124 and adjust theinduced birefringence accordingly. For example, system 200 of FIG. 2includes all of the same elements found in FIG. 1, and further includesa control system that includes intensity detector 226 and controller224.

Intensity detector 226 can detect the illumination intensities fromoutput beam 124 that correspond to each individual optical sub-element111, for example. The detected intensities are transmitted to controller224 via feedback signal 228. In response to feedback signal 228,controller 224 transmits control signal 230 to birefringence inducer108. Birefringence inducer 108 accordingly adjusts the birefringence ofeach individual optical sub-element 111 under control of control signal230.

According to some embodiments, optical element 110 includes an array ofbirefringence-controllable adjustable optical compensators through whichbirefringence is induced. Similar to an array of optical plates, anarray of adjustable optical compensators can be of any size. Anadjustable optical compensator can include an adjustable waveplate orretardation plate made of a birefringence-controllable material. Anadjustable optical compensator can also include its own adjuster toadjust birefringence. An example of an adjustable optical compensator isthe commercially available Soleil-Babinet Compensator (SBC), use ofwhich will now be described.

FIGS. 3 and 4 show examples of different states of a Soleil-BabinetCompensator (SBC), shown as an example of an adjustable opticalcompensator. Soleil-Babinet Compensator 300 includes a movable longwedge 330, a fixed short wedge 332 having the same angle as long wedge330, and fixed plate 334. As shown in FIGS. 3 and 4, long wedge 330 andshort wedge 332 are placed in parallel such that their hypotenuses faceeach other. Long wedge 330 and short wedge 332 are usually separated bya small air space (not shown). Fixed plate 334 is placed below fixedshort wedge 332, as shown. Long wedge 330 and short wedge 332 can bemade from birefringence-controllable materials, such as crystallinequartz, Magnesium Fluoride (MgF₂), Cadmium Sulphide (CdS), or CadmiumSelenide (CdSe), for example, or any other birefringence-controllablematerials. Long wedge 330 and short wedge 332 can each be made from thesame material or different material.

Fixed plate 334 can also be made of the same material or differentmaterial as that of either (or both) of the long wedge 330 and shortwedge 332. However, fixed plate 334 should have an optic axis orthogonalto that of the wedge pair. In an alternative embodiment that does notuse a fixed plate 334, long wedge 330 should have an optic axisorthogonal to that of short wedge 332 (i.e., one wedge should beoriented in the optical active direction, and the other wedge should beoriented in the optical passive direction). However, in this alternativeembodiment, polarization retardation will typically not be uniform.

Retardation of polarization is altered and a change in birefringenceoccurs in Soleil-Babinet Compensator 300 by moving long wedge 330 in adirection perpendicular to a light beam 336 and along the axis createdby the adjacent hypotenuses of wedges 330 and 332. When movable longwedge 330 is placed so that the effective plate formed by long wedge 330and short wedge 332 is at its minimum thickness, which is the samethickness (X) as fixed plate 334 as shown in FIG. 3, minimum (i.e.,little or no) retardation occurs. Alternatively, when movable long wedge330 is placed so that the effective plate formed by long wedge 330 andshort wedge 332 is at its maximum thickness (which is greater thanthickness X of fixed plate 334, as shown in FIG. 4), maximum retardationoccurs. In this configuration, maximum birefringence is induced, whichhas the effect of reducing the illumination intensity of the light beamthrough the Soleil-Babinet Compensator 300. A range of polarizationretardation (and induced birefringence) exists for locations of movablelong wedge 330 in-between these two extremes.

As stated earlier, adjustable optical compensators can include adjustersto adjust the location of long wedge 332, and therefore adjustbirefringence. For example, a Soleil-Babinet Compensator can include amechanism to move long wedge 330 to different locations in relation toshort wedge 332, as discussed above. The Soleil-Babinet Compensator caninclude, for example, a spring-loaded stage on which long wedge 330 ismounted, which can be moved by a digital micrometer or micrometer screw,for example.

Exemplary Operation

FIG. 5 is a flowchart depicting a method 500, according to an embodimentof the present invention. Method 500 can be used during operation ofsystems 100 and 200, or other similar systems.

Method 500 begins at step 502. In step 504, substantially all of apolarized light beam is transmitted to a birefringence-controllableoptical element. In step 506, birefringence of the optical element isadjusted to produce a polarization-retarded light beam. The adjustmentcan be made, for example, via means described elsewhere in thisdocument. The polarization-retarded light beam has a retardedpolarization due to passage through the optical element. In step 508,the polarization-retarded light beam is linearly polarized to produce alinear polarized modified intensity light beam. The polarization in step508 filters out unwanted polarization and intensity. The methodconcludes at step 512.

An alternative embodiment includes step 510, shown by dashed lines inFIG. 5. In step 510, the adjustment of birefringence is controlled. Inone embodiment, step 510 includes the steps as depicted in FIG. 6. Instep 620, illumination intensities of the linear polarized modifiedintensity light beam are detected. In step 622, a control signal isgenerated based on the detected illumination intensities. In step 624,the control signal is used to control the adjusting in step 506. In step626, the method returns to step 506 of method 500. In this manner, theillumination intensity of the resulting light beam after it passesthrough the linear polarizer can be controlled. If any portion of thelight beam that has passed through the linear polarizer is not of adesired intensity, step 510 can adjust it accordingly.

Exemplary Environment Lithography

FIG. 7 shows an example lithography system 700 having a uniformitycompensator therein, according to embodiments of the present invention.In FIG. 7, radiation from a polarized illumination system 744illuminates a pattern generator 750 to produce patterned light, which isdirected from pattern generator 750 toward an object 756 via aprojection system 754. In various embodiments, object 756 is, but is notlimited to, a work piece, a substrate, a wafer, a flat panel displaysubstrate, a print head, micro or nano-fluidic devices, or the like.

As is known, polarized illumination system 744 can include a lightsource 740 and illumination optics 742. Pattern generator 750 can alsoinclude optics (not shown). One or both of these optics can include oneor more optical elements (not shown) (e.g., lenses, mirrors, etc.) aswould be apparent to those of ordinary skill in the relevant art.

In various examples, pattern generator 750 can be a mask-based ormaskless pattern generator, as would become apparent to one of ordinaryskill in the art. The masked-based or maskless pattern generator can beassociated with lithography, photolithography, microlithography, orimmersion lithography, for example.

The uniformity compensator shown in example lithography system 700includes birefringence-controllable optical element 746, birefringenceinducer 748, and linear polarizer 752, as discussed above in regard toFIGS. 1-6. Depending on the use of the uniformity compensator, theuniformity compensator can be positioned in various parts of lithographysystem 700. In the example of lithography system 700 of FIG. 7, theuniformity compensator is shown with optical element 746 prior to thepattern generator 750, and polarizer 752 is shown after patterngenerator 750. The polarized illumination system 744 is opticallycoupled to birefringence-controllable optical element 746, which isoptically coupled to pattern generator 750, which is optically coupledto linear polarizer 752, which is optically coupled to projection system754, which is optically coupled to object 756. Birefringence inducer 748is coupled to birefringence-controllable optical element 746. Thisconfiguration allows for a more uniform illumination intensitydistribution over the pattern generator. The example embodiment oflithography system 700 having a uniformity compensator therein aspresented here is by way of example only, and not limitation. Otherembodiments will be apparent to persons skilled in the relevant artwithout departing from the spirit and scope of the invention. Forexample, optical element 746 can be located inside of illuminationsystem 744, such as part of illumination optics 742.

In one embodiment, an optional control system 758 can be used to makeadjustments to birefringence-controllable optical element 746. Controlsystem 758 includes an intensity detector 759 and controller 760.Intensity detector 759, controller 760, and birefringence inducer 748are coupled in a feedback loop. During operation of this embodiment,intensity detector 759 detects illumination intensities from an outputbeam exiting projection system 754. The detected intensities aretransmitted to controller 760 via feedback signal 762. In response tofeedback signal 762, controller 760 transmits control signal 764 tobirefringence inducer 748 associated with optical element 746. Thebirefringence inducer 748 can use control signal 764 to accordinglyadjust the birefringence of optical element 746. The optional controlsystem 758 in lithography system 700 as presented here is by way ofexample only, and not limitation. Other embodiments will be apparent topersons skilled in the relevant art without departing from the spiritand scope of the invention. For example, intensity detector 759 can belocated in various positions within lithography system 700, such asimmediately following linear polarizer 752.

CONCLUSION

As described above, embodiments of the present invention provide asystem and method utilizing a birefringence-controllable optical elementupon which birefringence is induced to change an index of refractionwithin the optical element. The change in the index of refractionimparts a change to the optical performance of the optical element, suchthat the illumination intensity of a polarized beam of radiation changesas it passes through the optical element and subsequently placedpolarizer. Individually adjusting variable illumination intensitieswithin a light beam using this technique can result in a light beam ofmore uniform illumination intensity and/or an intensity distributionclosely matching a desired intensity distribution.

Further embodiments of this invention are possible. For example, opticalelement 110 can include a single optical plate. In this embodiment, avariable static force field (e.g., birefringence inducer 108) can beapplied to the single optical plate to variably induce birefringence. Acontrol system similar to the one described herein can be used tocontrol the variable static force field. As another example of a furtherembodiment, two-dimensional uniformity correction is provided using asecond, ninety-degree (90°) rotated, set of optical plates or adjustableoptical compensators. One set can be used for uniformity correction inthe left-to-right direction, and another set can be used for uniformitycorrection in the top-to-bottom direction.

The present invention can provide correction for high frequencyvariation. Additionally, the present invention can have little or noeffect on dose quantization (i.e., there is no change of effective slitwidth, and the number of pulses in the slit remains the same). Theinvention can be implemented in a relatively small space with few or nomoving parts. In addition, the invention can be implemented with avirtually unlimited number of optical plates that can be placed veryclose together.

While various embodiments of the present invention have been describedabove, it should be understood that they have been presented by way ofexample only, and not limitation. It will be apparent to persons skilledin the relevant art that various changes in form and detail can be madetherein without departing from the spirit and scope of the invention.Thus, the breadth and scope of the present invention should not belimited by any of the above-described exemplary embodiments, but shouldbe defined only in accordance with the following claims and theirequivalents.

It is to be appreciated that the Detailed Description section, and notthe Summary and Abstract sections, is intended to be used to interpretthe claims. The Summary and Abstract sections may set forth one or more,but not all exemplary embodiments of the present invention ascontemplated by the inventor, and thus, are not intended to limit thepresent invention and the appended claims in any way.

1. A lithography system, comprising: a polarized illumination sourceconfigured to provide polarized light; a birefringence-controllableoptical element optically coupled to the polarized illumination source;a birefringence inducer coupled to the birefringence-controllableoptical element and configured to induce birefringence on thebirefringence-controllable optical element to providepolarization-retarded polarized light; a pattern generator opticallycoupled to the birefringence-controllable optical element; a linearpolarizer optically coupled to the pattern generator and configured to(i) receive the polarization-retarded polarized light and (ii) modifyintensity distribution of the polarization-retarded polarized light toprovide modified polarization-retarded polarized light; and a projectionsystem configured to project the modified polarization-retardedpolarized light.
 2. The system of claim 1, wherein thebirefringence-controllable optical element comprises an array ofbirefringence-controllable optical plates.
 3. The system of claim 2,wherein the birefringence inducer comprises an external force generator.4. The system of claim 3, wherein the external force generator is amechanical force generator.
 5. The system of claim 3, wherein theexternal force generator is an acoustic wave generator.
 6. The system ofclaim 3, wherein the external force generator is an electric fieldgenerator electromagnetically coupled to the birefringence-controllableoptical element.
 7. The system of claim 3, wherein the external forcegenerator is a magnetic field generator magnetically coupled to thebirefringence-controllable optical element.
 8. The system of claim 1,wherein the birefringence-controllable optical element comprises anarray of birefringence-controllable adjustable optical compensators. 9.The system of claim 1, further comprising: a control system coupled tothe linear polarizer and the birefringence inducer.
 10. The system ofclaim 9, wherein the control system comprises: a detector opticallycoupled to the linear polarizer that receives an output beam from thelinear polarizer and detects illumination intensities of the outputbeam; and a controller coupled to the detector and the birefringenceinducer that generates a control signal from the detected illuminationintensities and transmits the control signal to the birefringenceinducer.
 11. The system of claim 1, wherein thebirefringence-controllable optical element comprises a singlebirefringence-controllable optical plate.
 12. The system of claim 11,wherein the birefringence inducer comprises a variable static forcefield generator.
 13. A method of device manufacturing comprising:producing a polarized light beam; retarding polarization of thepolarized light beam; generating a pattern of the polarization-retardedlight beam; linearly polarizing the polarization-retarded light beam toproduce a linear polarized modified intensity light beam of the pattern;and projecting the linear polarized modified intensity light beam onto atarget portion of a substrate.
 14. The method of claim 13, wherein theproducing the polarized light beam comprises producing a linearlypolarized light beam.
 15. The method of claim 13, wherein the retardingpolarization of the polarized light beam comprises adjustingbirefringence of a birefringence-controllable optical element.
 16. Themethod of claim 15, wherein the adjusting comprises applying an externalforce on the birefringence-controllable optical element.
 17. The methodof claim 15, wherein the adjusting comprises individually adjustingbirefringence of birefringence-controllable optical plates of an arrayof birefringence-controllable optical plates that make up thebirefringence-controllable optical element.
 18. The method of claim 13,wherein the adjusting comprises individually adjusting birefringence ofbirefringence-controllable adjustable optical compensators of an arrayof birefringence-controllable adjustable optical compensators that makeup the birefringence-controllable optical element.
 19. The method ofclaim 15, further comprising: controlling the adjusting birefringence ofthe birefringence-controllable optical element.
 20. The method of claim19, wherein the controlling comprises: detecting illuminationintensities of the linear polarized modified intensity light beam;generating a control signal based on the detected illuminationintensities; and performing the adjusting step based on the controlsignal.